Lot 1:

The University of Regensburg is planning to procure a new cluster in the Faculty of Physics consisting of facilities for molecular beam epitaxy (MBE), an evaporation or oxidation plant and a sputtering system. The MBE is dedicated, among other things, to the epitaxial deposition of materials with a high melting point and low vapor pressure (e.g. Pt, Ta, W) as well as metals with melting points up to 1500°C and oxides. A multi-pocket electron beam evaporator with flow rate measurement is to be used, as well as the possibility to heat the substrate to 1000°C and cool it <120K.

Lot2:

The sputtering system is intended to take over the deposition of antiferromagnetic and ferromagnetic materials, as well as materials with a high spin Hall angle (e.g. Pt, Ta, W) and good magnetic coupling properties (e.g. Ru, Ir) of two magnetic layers. At least 8 sputter source flanges are required for 2" sputtering sources.

The University of Regensburg (client) plans to procure a new cluster in the Faculty of Physics consisting of facilities for molecular beam epitaxy (MBE), an evaporation and oxidation plant and a sputtering system. The MBE system should have space for at least 7 cells, a manipulator suitable for sample heating (>1000°C) and cooling (<120K), a RHEED system for in-situ process tracking, a residual gas analyzer, a sufficient, oil-free pump system to bring the system to a low base pressure, which is to be achieved by the combination of turbomolecular and ion getter pumps and a quartz balance for flow rate calibration. In addition, a separately pumped and independently bake-out auxiliary chamber should be installed on the main chamber, which must house a multi-pocket electron beam evaporator (MPES) and offer the possibility of flow control and control by a cross-beam quadrupole mass analyzer. Such a chamber system has the advantage that the MPES can be filled and baked out without breaking the vacuum in the main chamber. In addition, the MBE should have an internal cooling jacket (Shroud), which cools the cell openings and minimizes the heat input and thus the pressure increase during operation of the evaporator cells. However, it is required that this Shroud is divided horizontally in two, whereby both parts can be operated independently with different coolants such as water or liquid nitrogen (LN2), which significantly increases the cost and energy efficiency of such equipment. The manipulator must be able to accommodate the existing sample holders (3-pin 2" sample holder design) from a transfer chamber. A semi-automatic control of the system, so that even more complex shift sequences can be handled, is also required. In addition, a standard effusion cell can be heated up to 1400°C incl. controllable power supply and two high-temperature cells up to 1700°C incl. controllable power supply.

Procurement of a new cluster consisting of facilities for molecular beam epitaxy (MBE), an evaporation or oxidation plant and a sputtering system. The sputtering chamber must be a UHV system that has space for at least 8 sputtering sources and allows at least three different process gases (Ar, N, O). The manipulator must be able to heat the samples to at least 1000°C at a partial oxygen pressure of >1e-2mbar and during the deposition process rotation and the application of a preload must be possible. The sputtering system must be equipped with at least 8 2-inch sputtering sources and two 750W-DC and two 300W-AC generators/power supplies and two 4-way switchboxes. The individual sputtering sources should be arranged confocal and also the angle of inclination of individual sputtering sources should be adjustable in-situ. The sputtering system must be baked out and a sample lock should be available, which can also take at least 4 samples at once and store them in-situ. The system must also be able to accommodate the existing sample holders (3-pin 2" sample holder design). A semi-automatic control of the system, so that even more complex shift sequences can be handled, is also required.