We seek a complete turn-key, standalone Ion Beam Etcher capable of very accurate etching of thin, nanometer-scale structures. The tool can be used for silicon and III-V semiconductors, but also to etch metals and various insulators on chips and wafers up to 150 mm.
More detailed requirements are presented in the invitation to tender, available on request at: registry@aalto.fi
Please include the reference D/119/01.01.04.00/2014 in the request message.