Procurement of a facility for XeF2-based gas-phase etching to equip the DLR Innovation Center Hamburg (IZHH) as part of the quantum computing initiative, including delivery, integration into the laboratory premises of the

customer, acceptance, commissioning and training according to specification as well as subsequent service/

Maintenance.

As part of DLR's quantum computing initiative, quantum computers using ion trap technology are being built in a clean room at the Hamburg Innovation Center in cooperation between industry and DLR.

To equip the new cleanroom, specific machinery is required for the production, processing and integration of ion trap chips and related quantum technologies. For this purpose, systems for a classic microstructuring process chain for the cleanroom are procured. Part of the process chain is the deposition and structuring of metallic, dielectric and semiconductor thin films on substrates with a maximum diameter of 150 mm.

For the structuring of Si layers, a system for XeF2-based gas phase etching is to be procured. Among other things, this process will be used to etching Si layers isotropically on 150 mm wafers in a dry process, for example for back-etching layers that act as masks or as release etching.

The contractor owes the delivery, introduction of the system into the customer's laboratory premises, acceptance, commissioning and training in accordance with the specification. In addition, service and maintenance services must be provided.

Further information can be found in the specifications attached to the procurement documents.