The purpose of this contract is to provide a new multi-chamber sputter system designed for superconductors. This

system aims to replace an existing deposition system that has been in use for over 20 years. The primary objective is

to enhance the capabilities of the current system. The desired outcome is a cutting-edge three-chamber setup

equipped with a wafer handler and a cassette loading load-lock. This upgraded system will serve the purpose of

depositing various types of superconductors, offering the flexibility to adjust the composition of the film's elements

over a wide temperature range. Additionally, this investment is intended to increase the amount of samples that can

be processed during a day.

The purpose of this contract is to provide a new multi-chamber sputter system designed for superconductors. This

system aims to replace an existing deposition system that has been in use for over 20 years. The primary objective is

to enhance the capabilities of the current system. The desired outcome is a cutting-edge three-chamber setup

equipped with a wafer handler and a cassette loading load-lock. This upgraded system will serve the purpose of

depositing various types of superconductors, offering the flexibility to adjust the composition of the film's elements

over a wide temperature range. Additionally, this investment is intended to increase the amount of samples that can

be processed during a day.