Procurement of a 1 UV Laser Writer for Maskless Lithography
Contract Value:
GBP 206K -
Notice Type:
Contract Notice
Published Date:
22 April 2024
Closing Date:
23 May 2024
Location(s):
UK UNITED KINGDOM
UKK SOUTH WEST (ENGLAND) (UK UNITED KINGDOM)
Description:
Procurement for a UV laser writer with hardware and software for computer-controlled exposure of wafers, photomask blanks, and sample pieces coated in photoresist to enable rapid prototyping of semiconductor devices on various substrate materials with sub-micron resolution.
Procurement of a 1 UV Laser Writer for Maskless Lithography. The Center for Device Thermography and Reliability is a research group within the Faculty of Science and Engineering at the University of Bristol. It is one of the UK’s leading groups in the research fields of power electronics and associated materials research, helping progress towards the improvement of charging technologies and associated net-zero carbon goals. Recent investment in the form of major new grants has provided an opportunity to procure new equipment to help deliver the goals of these projects, with part of this enabling greater use of semiconductor device manufacturing within the University of Bristol Cleanroom. The required equipment is a single UV laser writer, with associated hardware and software for operation, to enable the computer-controlled exposure of wafers, photomask blanks and sample pieces coated in photoresist. The machine is intended to provide a means to rapid prototype semiconductor devices fabricated on a variety of substrate materials including compound semiconductors, silicon and glass. The system will be required to pattern surfaces down to sub-micron resolution.
The required equipment is a single UV laser writer, with associated hardware and software for operation, to enable the computer-controlled exposure of wafers, photomask blanks and sample pieces coated in photoresist. The machine is intended to provide a means to rapid prototype semiconductor devices fabricated on a variety of substrate materials including compound semiconductors, silicon and glass. The system will be required to pattern surfaces down to sub-micron resolution.