For the structuring of metallic layers in particular, an ion beam etching system (IBE) is required. This should also support reactive ion beam etching (RIBE) and chemically assisted ion beam etching (CAIBE) as processes. Among other things, the processes are intended to structure Au, Al and SiO2 thin films on 150 mm wafers by means of a paint mask.
For the structuring of metallic layers in particular, an ion beam etching system (IBE) is required. This should also support reactive ion beam etching (RIBE) and chemically assisted ion beam etching (CAIBE) as processes. Among other things, the processes are intended to structure Au, Al and SiO2 thin films on 150 mm wafers by means of a paint mask.
Object of the order
• System according to specification incl. delivery, commissioning, acceptance and training
• Service and maintenance according to specification
Detailed description in Appendix 01 Terms of Reference (LB IBE) in the tender documents.