A PVD reactor system shall be procured for the development of nanostructured surfaces and high-entropy alloys in the field of energy storage by hydrogen production, storage and reconversion into electricity.

With this system, planar (approx. 150x150 mm) and tubular substrates, e.g. films, tubes or membranes, can be coated with metallic, magnetic and/or carbon layers in vacuum by means of cathode atomization and the coating processes consisting of a large number of repeating process steps can be operated in an automated mode.

The use of angle-adjustable cathodes is intended to allow a vertical and confocal arrangement of the sources. Stacking layers and co-sputtering should thus be possible through the same system. In this way, an efficient coating method is to be ensured, which leads to reproducible results.