Reactive ion etching system (RIE)

A reactive ion etching system (RIE) is procured. The system is used to manufacture superconducting quantum circuits, structuring Spintronic materials and quantum materials in general. The system is therefore intended to enable a variety of different etching processes and combinations, as well as allowing the ability to monitor the individual process steps for reproducible production of samples of the highest quality. The detailed specifications are detailed in the SOW. Exclusion criteria regarding technical specifications are:

- the maximum footprint is 2500 mm x 1100 mm, maximum height 2450mm

- to install the system, all components must fit through a door opening of 210 cm x 155 cm

- the maximum footprint of the gas purification system must be 1500 mm (width) x 1500 mm (depth) x 2200 mm (height)

- delivery time must not exceed 6 months