The objective is to purchase an electron beam lithography (EBL) system. The EBL system should be capable of pattern resists at the nanoscale for fabrication of desired nanostructured surfaces of various materials and on various types and sizes of substrates.

Scope and objective

The objective is to purchase an electron beam lithography (EBL) system. The EBL system should be capable of pattern resists at the nanoscale for fabrication of desired nanostructured surfaces of various materials and on various types and sizes of substrates.

A more detailed description of the procurement object and the requirements is presented in chapter 2, Specification of requirements.

A contract, consisting of the purchase contract and a service contract, (the Contract) will be signed with one (1) supplier.

The objective is to purchase an electron beam lithography (EBL) system. The EBL system should be capable of pattern resists at the nanoscale for fabrication of desired nanostructured surfaces of various materials and on various types and sizes of substrates.

Scope and objective

The objective is to purchase an electron beam lithography (EBL) system. The EBL system should be capable of pattern resists at the nanoscale for fabrication of desired nanostructured surfaces of various materials and on various types and sizes of substrates.

A more detailed description of the procurement object and the requirements is presented in chapter 2, Specification of requirements.

The EBL system together with necessary licenses to software (and any exercised option) will hereinafter be called the System.

Tenderers must submit a tender including all aspects of specified requirements.

A contract, consisting of the purchase contract and a service contract, (the Contract) will be signed with one (1) supplier.