Delivery of an electron beam lithography system

The electron beam lithography system will be used in the QSens project for the production and use of quantum sensors. Within the project, defect centers will be used in specially structured diamond samples to produce novel and more sensitive sensors. The device is required to use electron beam lithography to produce the nanometer or micrometer-sized structures from or on diamond samples. This is a prerequisite for the desired increase in sensitivity of the sensors.