The equipment will be dedicated to the production of thin metal films. The system should allow the deposit of 6 different materials (gold, platinum, chromium, titanium, germanium, aluminum for example). An in-situ etching system will allow the etching of a few nanometers of semiconductor surface depth and also the removal of residual traces of resin during lift-off processes. The homogeneity and reproducibility of the engraving system is one of the important points of the equipment. The system will be designed for use in ISO6 class (class 1000) cleanroom use.

The benefits include at least:

- The launch of manufacturing

- Delivery

- The installation

- Commissioning

- Documentation

- Training.

- One-year warranty