Imperial College London seeks the purchase of a 4inch Graphene Metal Cluster Deposition System which must comply with the following core requirements.

1. Full recipe-driven automated system for in-situ deposition of metal-graphene multilayer structures that (i) consists of ultrahigh vacuum (UHV) chamber (for metal deposition) and an advanced graphene CVD module connected via a sample entry chamber (requirements for all chambers are provided below) and (ii) have provision for connection of a future module (not part of this project) dedicated to high k dielectric layers growth e.g. atomic layer deposition (ALD) chamber.

2. The superimposed load on the system caster/feet should NOT exceed 5kN/m2.