The Ilmenau University of Technology intends to expand the technological equipment in the area of research on micro- and nanotechnology. For this purpose, it is envisaged to procure a laser-based UV lithography equipment without the use of automatic alignment masks for wafers up to 150 mm diameter with sub-micron resolution at high throughput for applications in micro- and nanotechnology.

What is needed is a plant for maskless laser-based UV lithography in the laboratory with direct use of mask data in common formats (DXF, Gerber, GDSII, CIF) with very high demands in terms of flexibility, precision and throughput. Important features are the suitability for wafers up to 150 mm diameter, sub-micron resolution and alignment accuracy, automatic alignment and very high throughput in the laboratory. Detailed requirements are described in the specifications.